Highly Sensitive and Stable SERS Substrate Fabricated by Co-sputtering and Atomic Layer Deposition.
Author: Yin G1,2, Bai S1,2, Tu X1, Li Z1,2, Zhang Y1,2, Wang W3, Lu J4, He D1,2.
Optical Performance of Top-Down Fabricated AlGaN Nanorod Arrays with Multi-Quantum Wells Embedded.
Author: Ge S1, Dai J2, Gao N1, Lu S1, Li P1, Huang K3, Liu B4, Kang J1, Zhang R1,2, Zheng Y2.
英文介紹
Nanoscale Research Letters雜志英文介紹
Nanoscale Research Letters (NRL) provides an interdisciplinary forum for communication of scientific and technological advances in the creation and use of objects at the nanometer scale. NRL is the first nanotechnology journal from a major publisher to be published with Open Access.
Nanoscale Research Letters雜志CiteScore 評(píng)價(jià)數(shù)據(jù)
CiteScore 值:15
SJR:1.016
SNIP:1.568
學(xué)科類別
分區(qū)
排名
百分位
大類:Physics and Astronomy小類:Condensed Matter Physics
Q1
14 / 434
96%
大類:Physics and Astronomy小類:General Materials Science
Q1
39 / 463
91%
歷年影響因子和期刊自引率
投稿經(jīng)驗(yàn)
Nanoscale Research Letters雜志投稿經(jīng)驗(yàn)
該雜志是一本國(guó)際優(yōu)秀雜志,在國(guó)際上有較高的學(xué)術(shù)影響力,行業(yè)關(guān)注度很高,已被國(guó)際權(quán)威數(shù)據(jù)庫(kù)SCIE收錄,該雜志在MATERIALS SCIENCE, MULTIDISCIPLINARY綜合專業(yè)領(lǐng)域?qū)I(yè)度認(rèn)可很高,對(duì)稿件內(nèi)容的創(chuàng)新性和學(xué)術(shù)性要求很高,作為一本國(guó)際優(yōu)秀雜志,一般投稿過(guò)審時(shí)間都較長(zhǎng),投稿過(guò)審時(shí)間平均約48 days, to first decision for reviewed manuscripts only; 30 days, to first decision for all manuscripts; 103 days, from submission to acceptance; 22 days, from acceptance to publication 約2.7個(gè)月 ,如果想投稿該刊要做好時(shí)間安排。版面費(fèi)不祥。該雜志近兩年未被列入預(yù)警名單,建議您投稿。如您想了解更多投稿政策及投稿方案,請(qǐng)咨詢客服。