該雜志國際簡稱:ARQ,是由出版商Pontificia Universidad Catolica de Chile出版的一本致力于發(fā)布藝術(shù)學(xué)研究新成果的的專業(yè)學(xué)術(shù)期刊。該雜志以ARCHITECTURE研究為重點(diǎn),主要發(fā)表刊登有創(chuàng)見的學(xué)術(shù)論文文章、行業(yè)最新科研成果,扼要報道階段性研究成果和重要研究工作的最新進(jìn)展,選載對學(xué)科發(fā)展起指導(dǎo)作用的綜述與專論,促進(jìn)學(xué)術(shù)發(fā)展,為廣大讀者服務(wù)。該刊是一本國際優(yōu)秀雜志,在國際上有很高的學(xué)術(shù)影響力。
Arq is an academic journal dedicated to architectural research. Covering cutting-edge work in various aspects of architecture, including architectural design, urbanism, history, theory, environmental design, construction, materials, information technology, and practice. The journal also includes interviews, periodic reports, active letter pages, book reviews, and a concluding special called 'Insight'. Journals publish reviews of important buildings in a detailed and in-depth manner, which is rare in today's architectural journals. The design of ARQ is elegant, the content is inspiring, and it often triggers thinking. It is a must read publication for practitioners, consultants, and academic researchers in the construction industry.